VNU. JOURNAL OF SCIENCE, Mathematics - Physics, T.xXI, n02, 2005
Abstract:
Thanks to almost transparent property of SU8 for wavelength of 365-
400nm, UV-LIGA technology using this photoresist has been applied to fabricate
high-aspect-ratio (HAR) microstructures. This allows transferring patterns with
vertical sidewall from masks to the photoresist. This paper introduces UV-LIGA
and its application in fabricating comb drive structure for an angular rate sensor of
linewidth and thickness of 50μm and 120μm, respectively.
