Photo-catalytic transparent heat mirror film TiO2/TiN/TiO2

Abstract

Transparent heat mirror thin films have high transmittance in the visible range of wavelength and high reflectance in the infrared range of wavelength. TiO2/TiN/TiO2 films prepared via a D.C reactive magnetron sputtering method on Corning glass and Alkali glass substrates, serve as transparent heat mirrors. The outer TiO2 layer has both the photo-catalytic and anti-reflective properties. The experiment data showed that the film thickness required for photocatalytic properties exceeds 350nm. In this report, we found the relationship between the thicknesses of the films via calculation and experiment. Prepared films have both catalytic and transparent heat mirror properties with an inner TiO2 layer thickness of 40 - 300nm, a sandwich TiN layer thickness of 22 - 35nm and an outer TiO2 layer thickness exceeding 350nm.