dc.contributor.author |
Pham, Huu Kien |
|
dc.contributor.author |
et al. |
|
dc.date.accessioned |
2011-06-08T16:44:39Z |
|
dc.date.available |
2011-06-08T16:44:39Z |
|
dc.date.issued |
2010 |
|
dc.identifier.citation |
29-35 |
vi |
dc.identifier.issn |
0866-8612 |
|
dc.identifier.uri |
http://tainguyenso.vnu.edu.vn/jspui/handle/123456789/12344 |
|
dc.description.abstract |
Simulation of the diffusion mechanism via microscopic bubbles in amorphous materials is carried out using the statistical relaxation models $Co_{81.5}B_{18.5}$ containing $2\times 10^5$ atoms. The present work is focused on the role of these bubbles for self-diffusion in amorphous solids. It was found that the numbers of the vacancy bubbles in amorphous $Co_{81.5}B_{18.5}$ vary from $1.4\times 10^{-3}$ to $4\times 10^{-3}$ per atom depending on the relaxation degree. The simulation shows the collective character of the atomic movement upon diffusion atoms moving. Due to the large size in comparison with B atom, the jump of a Co diffuses atom leads to a significant local rearrangement of the atoms located near the VB. Meanwhile, B diffuses like the movement of an interstitial impurity through the boron-VB. Diffusion coefficients have been calculated via the vacancy bubbles and they are consistent with experimental data. The effect of the relaxation is also investigated and interpreted as a result of vacancy-bubble annihilation during thermal annealing. |
vi |
dc.language.iso |
en |
vi |
dc.publisher |
Tạp chí Khoa học |
vi |
dc.subject |
Bubbles; Amorphous alloys; Vacancy bubbles; Diffusion mechanism; Statistical relaxation. |
vi |
dc.title |
Simulation study of microscopic bubbles in amorphous alloy $Co_{81.5}B_{18.5}$ |
vi |
dc.type |
Article |
vi |