| dc.contributor.author |
Le, Tran |
|
| dc.contributor.author |
Nguyen, Huu Chi |
|
| dc.contributor.author |
Tran, Tuan |
|
| dc.date.accessioned |
2011-04-20T03:47:02Z |
|
| dc.date.available |
2011-04-20T03:47:02Z |
|
| dc.date.issued |
2008 |
|
| dc.identifier.citation |
VNU Journal of Science, Mathematics - Physics 24 (2008) 231-237 |
vi |
| dc.identifier.issn |
0866-8612 |
|
| dc.identifier.uri |
http://hdl.handle.net/123456789/860 |
|
| dc.description |
VNU Journal of Science, Mathematics - Physics. Vol. 24 (2008), No 4 (M.P), P. 231-237 |
vi |
| dc.description.abstract |
Transparent heat mirror thin films have high transmittance in the visible range of
wavelength and high reflectance in the infrared range of wavelength. TiO2/TiN/TiO2 films
prepared via a D.C reactive magnetron sputtering method on Corning glass and Alkali glass
substrates, serve as transparent heat mirrors. The outer TiO2 layer has both the photo-catalytic and
anti-reflective properties. The experiment data showed that the film thickness required for photocatalytic
properties exceeds 350nm.
In this report, we found the relationship between the thicknesses of the films via calculation and
experiment. Prepared films have both catalytic and transparent heat mirror properties with an inner
TiO2 layer thickness of 40 - 300nm, a sandwich TiN layer thickness of 22 - 35nm and an outer
TiO2 layer thickness exceeding 350nm. |
vi |
| dc.language.iso |
en |
vi |
| dc.publisher |
ĐHQGHN |
vi |
| dc.subject |
Photo-catalytic |
vi |
| dc.subject |
heat mirror |
vi |
| dc.subject |
transmittance |
vi |
| dc.title |
Photo-catalytic transparent heat mirror film TiO2/TiN/TiO2 |
vi |
| dc.type |
Article |
vi |