Tungsten oxide film was deposited on ITO-coated glass by using RF magnetron
sputtering method from WO3 ceramic target. Thin film preparation – process took place in Ar + O2
plasma. The dependence of tungsten oxide film structure on experiment conditions was
investigated by X-ray diffraction (XRD) Raman spectroscopy. In this paper, we considered that
the thickness of ITO layers about 150nm to 350nm clearly effects on the Raman and XRD
spectrograms of WO3 films.
