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Please use this identifier to cite or link to this item: http://tainguyenso.vnu.edu.vn/jspui/handle/123456789/12258

Title: Diffusion thermopower of a p-type Si/Si1-xGex heterostructure at zero magnetic field
Authors: Huan T.D.
Hai N.P.
Keywords: 
Issue Date: 2007
Publisher: Physica Status Solidi (B) Basic Research
Citation: Volume 244, Issue 6, Page 2100-2108
Abstract: We calculate the diffusion thermopower of the degenerate two-dimensional hole gas in a p-type Si/SiGe, lattice mismatched heterostructure at low temperatures and zero magnetic field. The effects of possible scatterings, e.g. remote impurity, alloy disorder, interface roughness, deformation potential, and random piezoelectric on the hole mobility and the diffusion thermopower are examined. Calculated results are well fitted to the experimental data recently reported. In addition, we predict a possibility for the diffusion thermopower to change its sign as the SiGe layer thickness changes, the effect has not been discussed yet. © 2007 WILEY-VCH Verlag GmbH & Co. KGaA.
URI: http://tainguyenso.vnu.edu.vn/jspui/handle/123456789/12258
ISSN: 3701972
Appears in Collections:Articles of Universities of Vietnam from Scopus

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