Curie temperature enhancement Multilayer NdFeB thin films
Issue Date:
2008
Publisher:
Journal of the Korean Physical Society
Citation:
Volume 52, Issue 5, Page 1677-1680
Abstract:
Multilayer films of Si/Mo(20 nm)/[NdFeB(35 nm)/ Fe(dFe)]4/Mo(30 nm) (dFe- thickness of Fe layer = 0, 5, 10, 15 nm) were prepared by RF sputtering at room temperature. The effect of the thickness of the Fe buffer layers on the Curie temperature and the remanence magnetization of the films have been studied. The Curie temperature and remanence magnetization of the films increased from 315 °C to 335 °C and from 0.75 kG to 0.82 kG, respectively, when dFe was increased from 0 to 10 nm. However, the Curie temperature and the remanence decreased to 327 °C and 0.72 kG, respectively, when dFe reached 15 nm.