Survey of WO3 thin film structure built on ito/glass substrates by the Raman and xrd spectroscopies

Abstract

Tungsten oxide film was deposited on ITO-coated glass by using RF magnetron sputtering method from WO3 ceramic target. Thin film preparation – process took place in Ar + O2 plasma. The dependence of tungsten oxide film structure on experiment conditions was investigated by X-ray diffraction (XRD) Raman spectroscopy. In this paper, we considered that the thickness of ITO layers about 150nm to 350nm clearly effects on the Raman and XRD spectrograms of WO3 films.