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Title:
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Fabrication of high-aspect-ratio micro structures using uv-liga technology |
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Author:
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Nguyen, Thi Minh Hang; Chien-Hung, Ho; Vu, Ngoc Hung; Nguyen, Phu Thuy
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Abstract:
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Thanks to almost transparent property of SU8 for wavelength of 365-
400nm, UV-LIGA technology using this photoresist has been applied to fabricate
high-aspect-ratio (HAR) microstructures. This allows transferring patterns with
vertical sidewall from masks to the photoresist. This paper introduces UV-LIGA
and its application in fabricating comb drive structure for an angular rate sensor of
linewidth and thickness of 50μm and 120μm, respectively. |
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Description:
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VNU. JOURNAL OF SCIENCE, Mathematics - Physics, Vol. 21 , No. 2, 2005 |
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URI:
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http://hdl.handle.net/123456789/470
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Date:
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2005 |