| dc.contributor.author |
Nguyen, Thi Minh Hang |
|
| dc.contributor.author |
Chien-Hung, Ho |
|
| dc.contributor.author |
Vu, Ngoc Hung |
|
| dc.contributor.author |
Nguyen, Phu Thuy |
|
| dc.date.accessioned |
2011-04-18T09:07:55Z |
|
| dc.date.available |
2011-04-18T09:07:55Z |
|
| dc.date.issued |
2005 |
|
| dc.identifier.citation |
VNU. JOURNAL OF SCIENCE, Mathematics - Physics, T.xXI, n02, 2005 |
vi |
| dc.identifier.issn |
0866-8612 |
|
| dc.identifier.uri |
http://hdl.handle.net/123456789/470 |
|
| dc.description |
VNU. JOURNAL OF SCIENCE, Mathematics - Physics, Vol. 21 , No. 2, 2005 |
vi |
| dc.description.abstract |
Thanks to almost transparent property of SU8 for wavelength of 365-
400nm, UV-LIGA technology using this photoresist has been applied to fabricate
high-aspect-ratio (HAR) microstructures. This allows transferring patterns with
vertical sidewall from masks to the photoresist. This paper introduces UV-LIGA
and its application in fabricating comb drive structure for an angular rate sensor of
linewidth and thickness of 50μm and 120μm, respectively. |
vi |
| dc.language.iso |
en |
vi |
| dc.publisher |
ĐHQGHN |
vi |
| dc.subject |
UV-LIGA |
vi |
| dc.subject |
comb structure |
vi |
| dc.subject |
SU8 |
vi |
| dc.subject |
HAR |
vi |
| dc.title |
Fabrication of high-aspect-ratio micro structures using uv-liga technology |
vi |
| dc.type |
Article |
vi |